DFM has a up-to-date range of equipment

Below we list the major equipment DFM has available. Some of this equipment is even available for lease. In some cases, however, only when operated by DFM staff.

Please do not hesitate to contact us if you are interested in knowing more about lease of equipment. administration@dfm.dk

Equipment list

Equipment Description
Atomic force microscope (AFM) (Park System NX-20)
  Measurement range 100 × 100 × 15 µm3. Calibrated with a measurement accuracy down to 0.02 % for periods of 1 µm and 1 nm for step heights of 20 nm
  Liquid cell and temperature control from 4°C to 180°C.
  Materials properties measured by AFM indentation. Force from 0 to 1 mN, resolution down to 1 nN, depth down to 1 µm with a resolution of 0.1 nm. Young's modulus for the surface can be estimated in the range from 1 MPa to 10 GPa
  Scanning Kelvin Probe Force Microscopy (SKPFM) determines a DC potential difference between tip and sample which can be related to the work function of surface electrons: Dynamic range ±10 eV, noise level 0.02 eV
  Conductive atomic force microscopy measuring a current between AFM tip and a conductive sample which can be related to the local electronic properties such as the local density.
  AFM tips, more than 30 different types with radii of curvature from 2 nm to 0.75 µm, spring constant from 0.03 N/m to 2000 N/m and materials of e.g. silicon, tungsten carbide and diamond, polystyrene, gold, quartz and conductive tips with platinum from e.g. NanoSensors, TeamNanotech, etc.
   
AFM (Bruker Multimode8)
  Measurement volume up to 150 µm × 150 µm × 5 µm with a measurement uncertainty of 2 % to 10 %
  Liquid cell and temperature control 20°C to 60°C.
  Material properties measured by AFM indentation. Force from 0 to 1 mN, resolution down to 1 nN, depth down to 1 µm with a resolution of 0.1 nm
  Scanning Kelvin Probe Force Microscopy (SKPFM) determines a DC potential difference between tip and sample, and can be related to the properties of the work function of surface electrons: Dynamic range ±10 eV, noise level 0.02 eV
   
Confocal and interference microscope (Sensofar PLu Neox)
  Non contact 3D profiling, confocal and interference microscope with six objectives, a lateral measurement range from 85 × 64 µm2 to 1.27 × 0.97 mm2, and a vertical measurement range from 5 nm to 10 mm. The instrument is calibrated with lateral measurement accuracy down to 0.15 % for a period of 10 µm and a vertical measurement accuracy down to 3 nm
  Surface topology. Fast and precise measurement of surfaces and interfaces protected by a transparent layer.
   
Optical diffraction microscope (Designed and developed by DFM)
  Measurement of surface topologies with an accuracy down to 1 nm
  Real time surface profiling
   
Diffraction setup (Designed and developed by DFM)
  Two rotational stages and goniometres with an accuracy down to 3 × 10-4. Measurement of grating periods with a measurement accuracy better than 0.5 nm for gratings with a period larger than 1 µm
  Roughness measurement equipment: Calibration of optical instruments for measuring surface roughness
   
Mueller Polarimeter (Designed and developed by DFM)
  Measurement of surface topology, thin films and refractive indices for materials.
  Refractive index for thin films can be determined with an absolute accuracy down to 1 × 10-3
  The thickness of thin films can be determined with an absolute accuracy down to 5 × 10-4
  The line width of periodic structures can be determined with an absolute accuracy down to 0.5 nm
  The height of periodic structures can be determined with an absolute accuracy down to 1.0 nm
   
Static light scattering (diffraction) for measurement of particle diametres (Malvern Mastersizer 2000)
  0.1 µm to 2,000 µm
   
Particle Counter Spectrometer (Particle Measuring Systems LAS-X II)
  0,1 µm til 7 µm i 100 kanaler.
  Koncentrationen af partikelstørrelser med gennemsnitsdiametre mellem 500 og 5000 nm. Kalibreret med en usikkerhed på partikelantal på 5 til 8 %
   
Roughness Measurement equipment (Taylor Hobson)
  Measurement uncertainty app. 2% for an Ra of 6 µm
   
Interferometer (Zygo)
  Displacement measurement. Calibrated with an accuracy down to 0.3 nm or 4 × 10-7
   
Stage (nPoint)
  Scanning range 500 µm × 500 µm (PI) and stage with a scanning range of 400 µm × 400 µm × 100 µm
   
Normals Traceable to international recognised normals
  Step height of nominal 1 µm with a measurement uncertainty of 1.2 nm
  Two-dimensional grating with a period of 1 µm with a measurement uncertainty of 0.017 nm
   
Analysis software  
  Software package for nano- and microscale image processing and analysis (SPIP – Scanning Probe Image Processor, Image Metrology A/S)
  Image processing and analysis (XEP, Park Systems)
  Image processing and analysis (NanoScope Analysis, Bruker)
  Design software for optics (Zemax, Radiant Zemax)
  Design and measurement of thin films (FilmWizard, Scientific Computing International)
  Advanced FEM modelling software (JCMwave)
  DFM-GUM and DFM-LSQ measurement uncertainty (DFM)
  General image processing and analysis, Matlab (MathWorks)
   
Other equipment  
  Geometrical references: Many different gratings with step heights from 0.02 µm to 50 µm and gratings with periods from 0.07 µm to 125 µm as well as roughness, critical dimensions such as line width and angle (NanoSensors, Plano, TeamNanotech etc.)
  Ultraviolet ozone cleaning of surfaces (Bioforce nanoscience), UV-VIS-NIR Lightsource, wavelength range 200 nm to 1000 nm (Ocean Optics)
  Particle areosol generator for particle sizes ranging from 0.1 µm til 5 µm (CH Technologies, Inc) and pressurized air system (Norgren)
  Plasma cleaning of surfaces (Plasma system Zepto, Diener electronic GmbH)
  Wafer spinner (SPIN 150), Ultra sonic cleaner (Branson 1200), nitrogen and CO2 cleaning
  Biosafety cabinet (Holten Bio Safe), Work microscopes